The effect of low-energy Ga ions on GaAs/AlGaAs heterostructures

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Published under licence by IOP Publishing Ltd
, , Citation E H Linfield et al 1990 Semicond. Sci. Technol. 5 385 DOI 10.1088/0268-1242/5/5/002

0268-1242/5/5/385

Abstract

A high-mobility two-dimensional electron gas at a GaAs/AlGaAs heterojunction has been exposed to low-energy Ga ion beams. The authors report the reduction in both the sheet carrier density and mobility at 44 K for ion doses and energies in the range 1011-1012 cm-2 and 1-6 keV respectively. The sheet resistivity can be increased by a factor of 1010 with a dose of 2*1012 cm-2 ions at 6 keV. The ion irradiation also reduces the persistence of the low temperature photo-induced conduction and increases the amount of ionised impurity scattering. Reduced photoluminescence from wells close to the surface of a multiple quantum well structure extends the transport data to suggest a range of approximately=70 nm from the surface over which electronic properties are modified. An ultra-high vacuum compatible method for altering the surface electronic properties therefore seems viable.

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10.1088/0268-1242/5/5/002